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Wet film exposure for inner circuit

★ Deep cultivation of inner wet film field, special wet film processing efficiency breakthrough, up to 10500 panels/day

★ With high quality and high power composite wavelength laser light source, to achieve high adaptability of different photosensitive materials

★ Equipped with optimized target identification system

★ Exposure process is all digital operation, enter the industry 4.0 intelligent manufacturing

Technical parameters
  • Maximum exposure size

    Large table: 24.5" x 28.5"
    Standard table: 22"×24.5"

  • Interlayer alignment accuracy

    ±25μm

  • The light source

    405nm

  • Panel thickness

    Single machine: 0.05 - 5.0 mm
    In-line: 0.075 - 2.5 mm

  • The depth of field

    ±300μm

  • Line width precision

    ±10%

  • Registration accuracy

    ±12μm

  • Fitment

    Suitable for intelligent manufacturing systems

  • The production efficiency

    Single machine: 300 sides/hour
    In-line: 7000 panels/day

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